{"id":1119,"date":"2022-05-02T14:46:40","date_gmt":"2022-05-02T14:46:40","guid":{"rendered":"https:\/\/phynd.polimi.it\/?page_id=1119"},"modified":"2023-05-29T08:05:44","modified_gmt":"2023-05-29T08:05:44","slug":"equipment","status":"publish","type":"page","link":"https:\/\/phynd.polimi.it\/?page_id=1119","title":{"rendered":"Equipment and Methods"},"content":{"rendered":"\n

Our activities involve a range of techniques for the growth <\/a>of thin films and heterostructures, the nanoscale and bulk characterization<\/a>, the nanofabrication<\/a> and simulations<\/a>.<\/p>\n\n\n\n


Advanced Nanofabrication<\/h3>\n\n\n\n

Thermal Scanning Probe Lithography (tSPL) + Laser Writing – NanoFrazor Explore <\/h4>\n\n\n\n
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The Heidelberg NanoFrazor Explore is a dedicated Thermal Scanning Probe Lithography nanofabrication tool. It uses a ultra-sharp heatable probe tip for locally heating the substrate with sub-10 resolution. It is also equipped with a laser writer module for allowing mix-and-match tSPL and laser lithography. It allows in-situ imaging, markerless alignment, 3D nanopatterning capabilities with < 1 nm vertical resolution. The NanoFrazor equipped with a tuable magnetic field is used for performing thermally assisted magnetic scanning probe lithography (tam-SPL).<\/p>\n<\/div><\/div>\n\n\n\n

Thermal Scanning Probe Lithography (tSPL) – Keysight 5600LS<\/h4>\n\n\n\n
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tSPL and tamSPL are performed also using a customized 5600LS AFM system. The 5600LS AFM allows imaging of both large samples (in air) and small samples (in air, or in liquid under temperature control). The 5600LS utilizes a 200 mm x 200 mm, fully addressable and programmable stage, as well as a low-noise AFM design. Samples up to 8\u201d in diameter and 30mm tall are easily accepted by the 200mm vacuum chuck. The stage accommodates a 300 mm wafer with repositioning.<\/p>\n<\/div><\/div>\n\n\n\n

Optical \/ E-beam lithography – PoliFab <\/h4>\n\n\n\n
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Micro-nanofabrication techniques such as equipment for performing Optical \/ EBeam lithography are available in PoliFab, the micro-nanofabrication center of Politecnico di Milano<\/p>\n<\/div><\/div>\n\n\n\n

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Characterization <\/h3>\n\n\n\n

Scanning Probe Microscopy – Park NX 10 <\/h4>\n\n\n\n
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The Park NX 10 Scanning Probe Microscope allows to characterize with nanoscale resolution the morphology, electrical \/ magnetic properties, nanomechanical and thermal properties of a wide range of systems. A motorized coarse positioning system allows to investigate samples up to 2×2 cm2. The microscope is equipped with an 100×100 um2 in-plane piezoscanner. Measurements mode available include: AFM, Magnetic Force Microscopy in a variable magnetic field, Conductive-AFM, Kelvin Probe Force Microscopy, Piezo-Force Microscopy, Scanning Thermal Microscopy, Nanomechanics. A heatable stage from RT up to 250\u00b0C can be employed.<\/p>\n<\/div><\/div>\n\n\n\n

Kerr Magnetometry and Kerr Microscopy<\/h4>\n\n\n\n
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The Magneto-Optical Kerr Effect (MOKE) provides a powerful way for studying the magnetic behaviour of thin films by simply analyzing the light reflected from their surface. The incident light is polarized linearly before reaching the sample; the reflected light is analyzed through a polarizer (the analyzer). Two different setups are used depending on the application:<\/p>\n\n\n\n